This event ended. Thank you for coming.
Novellion Systems exhibited at SEMICON Japan 2016.
Dates: December 14th, 2016 (Wed.) to 16th (Fri.)
10: 00-17: 00
Venue: Tokyo Big Sight (East Exhibition Hall)
Exhibition Hall: 5
Our booth: No. 5815
We were showing the products as follows,
(1) “ECR line beam ion source (ELBS-150)”,
for reactive ion beam milling systems.
(2) “High power ECR plasma source (EPS-120)”,
for high speed etching systems or reactive plasma treat systems.
(3) “Compact ECR atomic/radical beam source (ERS-35)”,
with good using records of oxide/nitride shin film formation processes.