• Advanced plasma technology for next microfabrications!
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This event ended. Thank you for coming.

 Novellion Systems exhibited at SEMICON Japan 2016.

  [Exhibition information]
    Dates: December 14th, 2016 (Wed.) to 16th (Fri.)
               10: 00-17: 00
    Venue: Tokyo Big Sight (East Exhibition Hall)
    Exhibition Hall: 5
    Our booth: No. 5815

  We were showing the products as follows,
    (1) “ECR line beam ion source (ELBS-150)”,
             for reactive ion beam milling systems.
    (2) “High power ECR plasma source (EPS-120)”,
             for high speed etching systems or reactive plasma treat systems.
    (3) “Compact ECR atomic/radical beam source (ERS-35)”,
             with good using records of oxide/nitride shin film formation processes.