High power ECR plasma source (EPS-120)

  EPS-120 is an extremely dense plasma producing unit applied ECR discharge for MEMS processing systems.

[Merit]
  – Extra large volume ECR region by original magnet structure.
  – Capability of high power operations by excellent cooling systems.
  – Metal contamination free.
  – Compact module concept for the plural applying.

[Detail]
  – Vacuum port size : 120 mm dia.
  – Wave guide size : WR340
  – Microwave frequency : 2.45 GHz
  – Maximum Power : 2000 W
  – Cooling : water

[Applications]
  – Etching or ashing systems. 
  – Reactive ion beam etching systems.
  – Ion nitriding or oxidizing systems.
  – DLC coating systems.