It is a large ion source that can be applied to high-speed milling with large area ion beam. We will make to order according to your request.
-Optimization design of beam uniformity by charged particle trajectory simulations.
-By adoption of heat resistant low sputtering rate electrode material, Low energy / ampere class ion beam generation.
-Discharge type: Multi cusp type / hot cathode DC
(ECR plasma source can also be installed)
-Beam size: 350mm dia.
-Beam range: 1keV x 2A
-Ion source for MEMS processing equipment.