• TEL: +81-774-66-6387
  • Novelion Systems Co., Ltd. – Advanced plasma technology for next microfabrications!

%e5%9b%b31

 It is a large ion source that can be applied to high-speed milling with large area ion beam. We will make to order according to your request.

[Merit]
 -Optimization design of beam uniformity by charged particle trajectory simulations.
 -By adoption of heat resistant low sputtering rate electrode material, Low energy / ampere class ion beam generation.

[Detail]
 -Discharge type: Multi cusp type / hot cathode DC
       (ECR plasma source can also be installed)
 -Beam size: 350mm dia.
 -Beam range: 1keV x 2A

[Application]
 -Ion source for MEMS processing equipment.

shield-z-20-zplane
Simulation of first electron orbit.

135-1

135-2
Simulation of ion beam extraction.