• Advanced plasma technology for next microfabrications!


 It is a large ion source that can be applied to high-speed milling with large area ion beam. We will make to order according to your request.

 -Optimization design of beam uniformity by charged particle trajectory simulations.
 -By adoption of heat resistant low sputtering rate electrode material, Low energy / ampere class ion beam generation.

 -Discharge type: Multi cusp type / hot cathode DC
       (ECR plasma source can also be installed)
 -Beam size: 350mm dia.
 -Beam range: 1keV x 2A

 -Ion source for MEMS processing equipment.

Simulation of first electron orbit.


Simulation of ion beam extraction.