Ampere class ion source for milling equipment

　It is a large ion source that can be applied to high-speed milling with large area ion beam. We will make to order according to your request.

[Merit]
　-Optimization design of beam uniformity by charged particle trajectory simulations.
　-By adoption of heat resistant low sputtering rate electrode material, Low energy / ampere class ion beam generation.

[Detail]
　-Discharge type: Multi cusp type / hot cathode DC
　　　　　　　(ECR plasma source can also be installed)
　-Beam size: 350mm dia.
　-Beam range: 1keV x 2A

[Application]
　-Ion source for MEMS processing equipment.

Simulation of ion beam extraction.