• Advanced plasma technology for next microfabrications!

 [Exhibition information]

  Dates: December 13th, 2016 (Wed.) to 15th (Fri.)
                10: 00-17: 00

  Venue:Tokyo Big Sight (East Exhibition Hall)

  Exhibition hall:7

  Our booth:No.7424

We will introduce the following products at our booth.

 (1) “Compact ECR atomic/radical beam source (ERS-35)“,
     with good using records of oxide/nitride shin film formation processes.
 (2) “High power ECR plasma source (EPS-120)“,
     for high speed etching systems or reactive plasma treat systems.
 (3) “ECR line beam ion source (ELBS-150)“,
     for reactive ion beam milling systems.
 (4)”High Current DC Discharge Type Line Beam Ion Source (LBS-120HC)”
     for applicable to high speed ion beam milling equipment.