We will exhibit at SEMICON Japan 2023！

 [Exhibition information]

　　Dates: December 13th, 2016 (Wed.) to 15th (Fri.)
               　10: 00-17: 00

　　Venue：Tokyo Big Sight (East Exhibition Hall)

　　Exhibition hall：７

　　Our booth：No．７４２４

We will introduce the following products at our booth.

　(1) “Compact ECR atomic/radical beam source (ERS-35)“,
     with good using records of oxide/nitride shin film formation processes.
　(2) “High power ECR plasma source (EPS-120)“,
     for high speed etching systems or reactive plasma treat systems.
　(3) “ECR line beam ion source (ELBS-150)“,
     for reactive ion beam milling systems.
　(4)”High Current DC Discharge Type Line Beam Ion Source (LBS-120HC)”
     for applicable to high speed ion beam milling equipment.