• Advanced plasma technology for next microfabrications!

High-current DC discharge type fully automatic line beam ion source that can be applied to high-speed ion beam milling equipment

・High current density ion beam using hot cathode
・Excellent beam distribution uniformity due to optimized magnetic field design
・Fast beam adjustment with fully automated power control system

【Equipment specifications】
・Beam size:120mm×10mm(Compatible with large substrates)
・Beam energy:100~2,000 eV
・Beam current density:MAX 10mA/㎠
・Ionized gas:Hydrogen, nitrogen, rare gases, etc.
・Cooling method:water cooling

【Application example】
・High-speed milling of MEMS structures
・Fine milling of magnetic memory
・Resonance frequency adjustment of high frequency elements