{"id":171,"date":"2016-11-12T15:06:35","date_gmt":"2016-11-12T06:06:35","guid":{"rendered":"http:\/\/www.novelion-sys.com\/?page_id=171"},"modified":"2026-04-10T15:05:23","modified_gmt":"2026-04-10T06:05:23","slug":"preface","status":"publish","type":"page","link":"https:\/\/www.novelion-sys.com\/en\/preface\/","title":{"rendered":"Preface"},"content":{"rendered":"

Novelion Systems,<\/strong>\u00a0a technology development-oriented venture company, originated from large current negative ion source technologies for nuclear fusion plasma heating devices.<\/p>\n

Our vision is,
\n\u201dAdvanced plasma technology for next microfabrications!\u201d<\/strong><\/p>\n

With the spread of use of various sensor devices\u00a0and high-frequency circuit devices\u00a0due to the Internet of things (IoT), the new microfabrication systems are required in recent years, which can be applied with new materials such as piezoelectric films and magnetic films and so on, because conventional silicon process equipments are\u00a0hard to\u00a0treat those\u00a0materials.<\/p>\n

To meet these new technological needs, our company is developing high-density remote plasma sources and high-current ion beam sources using ECR (electron cyclotron resonance) and ICP (inductively coupled) discharge, which can utilize oxygen and various activated gases.<\/p>\n

We have\u00a0provided the products\u00a0as follows,<\/p>\n

(1) “ECR line beam ion source (ELBS-150)<\/strong>“,
\nfor reactive ion beam milling systems.<\/p>\n

(2) “High power ECR plasma source (EPS-120)<\/strong>“,
\nfor high speed etching systems or reactive plasma treat systems.<\/p>\n

(3) “Compact ECR atomic\/radical beam source (ERS-35)<\/strong>“,
\nwith good using records of oxide\/nitride shin film formation processes.<\/p>\n

We will continue to work toward the realization of innovative plasma equipment. Thank you for your good support.<\/p>\n

Novelion Systems Co., Ltd.
\nRepresentative director,
\nShuichi Maeno<\/p>\n","protected":false},"excerpt":{"rendered":"

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